APOGEE 統新光訊股份有限公司

研發技術

製程設備

鍍膜設備

反應式電漿真空鍍膜機

反應式電漿真空鍍膜機
+

性能

利用高密度電漿,轟擊材料(20mm直徑),使透明導電薄膜具高光學特性與高導電特性,石英膜厚監控方式。
Use high-density plasma, bombardment material (20mm diameter), to coated the transparent conductive film which has high optical and electrical conductivity performance, quartz thickness monitor mode.

直接式監控真空鍍膜機

直接式監控真空鍍膜機
+

性能

監控波長350~2400nm連續可調,具光學與石英兩種膜厚監控方式。
Monitor Wavelength is 350~2400nm, Continuously adjustable, with quartz & optical film thickness monitoring methods。

間接式監控真空鍍膜機

間接式監控真空鍍膜機
+

性能

監控波長350~1100nm 連續可調,具光學與石英兩種膜厚監控方式。
Monitor Wavelength is 350~1100nm, Continuously adjustable, with quartz & optical film thickness monitoring methods。

直接式監控真空鍍膜機

直接式監控真空鍍膜機
+

性能

監控波長600~1650nm連續可調,具光學與石英兩種膜厚監控方式。
Monitor Wavelength is 600~1650nm, Continuously adjustable, with quartz & optical film thickness monitoring methods

TOP